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Shared Use Centre Photomask
Design and Manufacture
Design and Manufacture
Products
The Center offers a photomask manufacture for conducting of lithographic processes in the following ways:
- contact photolithography, image scale 1:1;
- projection photolithography, image scale 10:1, 5:1, 4:1.
The photomasks are produced on substrates of soda lime or synthetic quartz with a chromic masking layer.
Dimension types of the photomasks to be produced: 127x127x2,24 mm (5009),
152х152х6,35 mm (6025), 177,4х177,4х3,1 mm (7012).
The quartz photomasks of a dimension type 152х152х6,35 mm can be equipped with pellicles.
Main specifications of the photomasks to be produced:
| Minimal feature on photomask (μm) | Type of photomask | Specifications | ||
| CD to target
(+/-μm) | Registration
(μm) | Defect size
(μm) | ||
| 0,6-0,9 | Binary | ≥0,08 | ≥0,15 | ≥0,25 |
| 1-2 | Binary | ≥0,1 | ≥0,15 | ≥0,25 |
| 2,5-5 | Binary | ≥0,1 | ≥0,15 | ≥0,5 |
| >5 | Binary | ≥0,1 | ≥0,15 | ≥0,5 |
Manufacture according to the international standards
The modern innovative infrastructure
Our partners
SCPDM
© 2008-2015
Contacts
+7 (499) 720-69-67
© 2008-2015
Contacts
+7 (499) 720-69-67
